The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Apr. 16, 2002
Tomohide Minami, Koshi-Machi, JP;
Shinichi Sugimoto, Kikuyo-Machi, JP;
Takahiro Kitano, Koshi-Machi, JP;
Jun Ookura, Koshi-Machi, JP;
Hiroaki Kurishima, Koshi-Machi, JP;
Tomohide Minami, Koshi-Machi, JP;
Shinichi Sugimoto, Kikuyo-Machi, JP;
Takahiro Kitano, Koshi-Machi, JP;
Jun Ookura, Koshi-Machi, JP;
Hiroaki Kurishima, Koshi-Machi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A coating solution is sprayed on a rotating wafer held horizontally from a nozzle provided above the wafer while the nozzle is travelling over the wafer from a wafer center to a wafer outer area, thus spirally spraying the coating solution on the wafer. The nozzle stops when the coating solution has reached the wafer outer area and the coating solution is sprayed in circle on the wafer outer area while the wafer is rotating. A coating solution including a component of a coating film and a solvent may be sprayed on a first area to be coated of the wafer and the coating solution and a solvent for the coating film may be sprayed on a second edge area located outside the first area of the wafer.