Hirayama Hideo

Title: Hirayama Hideo: Innovator in Array Substrate Technology

Introduction

Hirayama Hideo is a notable inventor based in Guangdong, China, recognized for his contributions to the field of thin-film transistors and array substrate technology. With a total of four patents to his name, Hideo has made significant advancements in the manufacturing methods of array substrates, which are crucial components in display technologies.

Latest Patents

Hideo's latest patents include innovative designs for array substrates and their manufacturing methods. One of his patents describes an array substrate that features first and second thin-film transistors formed on a base, spaced by a predetermined distance in a parallel arrangement. The first thin-film transistor consists of a first active layer, a first gate insulation layer, a first gate electrode, a first interlayer insulation layer, and first source/drain electrodes, all sequentially stacked on the base. The second thin-film transistor is similarly structured, with a second gate electrode, a second gate insulation layer, second source/drain electrodes, and a second active layer. Notably, the first active layer and the first gate electrode are made from a poly-silicon material, while the second active layer utilizes an oxide semiconductor material.

Career Highlights

Hirayama has worked with prominent companies in the optoelectronics sector, including Wuhan China Star Optoelectronics Technology Co., Ltd. and Wuhan China Star Optoelectronics. His experience in these organizations has allowed him to refine his expertise in the development of advanced display technologies.

Collaborations

Hirayama has collaborated with notable colleagues in his field, including Hajime Nagai and Nagai Hajime. These partnerships have contributed to the innovative projects he has undertaken throughout his career.

Conclusion

Hirayama Hideo stands out as a significant figure in the realm of array substrate technology, with a focus on enhancing the performance and manufacturing processes of thin-film transistors. His contributions continue to influence advancements in display technologies.