Hieng-Hsiung Huang

Title: Hieng-Hsiung Huang: Innovator in Light Technology and Thin Film Transistors

Introduction

Hieng-Hsiung Huang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the fields of lighting technology and semiconductor manufacturing. With a total of two patents to his name, Huang's work reflects his commitment to innovation and technological advancement.

Latest Patents

Huang's latest patents include an anti-glare light source and methods for forming thin film poly silicon layers and thin film transistors. The anti-glare light source features a linear light source, a sleeve, and a light adjusting element that includes multiple prism portions. This design allows for improved light distribution along the linear light source, enhancing visibility and reducing glare. The methods for forming thin film poly silicon layers involve a substrate, heating treatment, and a silicon thin film deposition process, leading to the creation of a semiconductor pattern through a series of precise steps.

Career Highlights

Huang is currently associated with Wintek Corporation, where he applies his expertise in developing innovative technologies. His work has been instrumental in advancing the capabilities of light sources and semiconductor devices, contributing to the overall progress in these industries.

Collaborations

Huang has collaborated with talented coworkers, including Ming-Chuan Lin and Zhi-Ting Ye. Their combined efforts have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Hieng-Hsiung Huang stands out as a prominent inventor whose work in light technology and thin film transistors has made a lasting impact. His patents reflect a deep understanding of the technical challenges in these fields and a dedication to finding effective solutions.