Wintek Corporation

Hieng-Hsiung Huang

Wen-Chun Wang

Zhi-Ting Ye

Chin-Chang Liu

Ming-Chuan Lin

Heng-Yi Chang

An anti-glare light source including a linear light source, at least one sleeve and a light adjusting element is provided. The linear light source is suitable for providing a light. The sleeve covers at least one end of the linear light source. The light adjusting element is disposed between the sleeve and the linear light source, wherein the light adjusting element includes a plurality of prism portions. The prism portions cover a portion of the linear light source and arrange along the extension direction of the linear light source, such that the distribution of the light converges along the extension direction of the linear light source.

Anti-glare light source

A method of forming a thin film poly silicon layer includes following steps. Firstly, a substrate is provided. A heating treatment is then performed. A thin film poly silicon layer is then directly formed on a first surface of the substrate by a silicon thin film deposition process. A method of forming a thin film transistor includes following steps. Firstly, a substrate is provided. A heating treatment is then performed. A thin film poly silicon layer is then directly formed on a first surface of the substrate by a silicon thin film deposition process. A first patterning process is performed on the thin film poly silicon layer to form a semiconductor pattern. Subsequently, a gate insulation layer, a gate electrode, a source electrode and a drain electrode are formed.

Growing community of inventors

Hsinchu, Taiwan

Hieng-Hsiung Huang