Hielke Schoonewelle

Title: Innovator Spotlight: Hielke Schoonewelle

Introduction: Hielke Schoonewelle is a talented inventor based in Veldhoven, Netherlands, known for his innovative contributions in the field of device manufacturing and lithographic apparatus. With two patents to his name, Schoonewelle has made significant advancements in the industry.

Latest Patents: One of Hielke Schoonewelle's latest patents is a method for determining a map of a second part of a substrate belonging to a group of substrates. This method involves measuring a first part of at least one substrate to create an average profile or height map and computing a map of the second part based on the average map. The computed map is stored for future use in determining the height or tilt of substrates within the group.

Career Highlights: Hielke Schoonewelle is currently working at ASML Netherlands B.V., a prominent company in the industry. His expertise and innovative thinking have led to the development of cutting-edge technologies that have revolutionized the manufacturing process of devices and lithographic apparatus.

Collaborations: Schoonewelle has collaborated with esteemed professionals in the field, including Marcus Emile Joannes Boonman and Ralph Brinkhof. Through these collaborations, he has been able to exchange ideas, drive innovation, and achieve remarkable milestones in his career.

Conclusion: Hielke Schoonewelle's dedication to research and development, coupled with his ability to think outside the box, has positioned him as a leading inventor in the field of device manufacturing and lithographic apparatus. His contributions continue to shape the industry and inspire future generations of innovators.