The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2010

Filed:

Oct. 15, 2007
Applicants:

Hielke Schoonewelle, Veldhoven, NL;

Marcus Emile Joannes Boonman, Waarle, NL;

Ralph Brinkhof, Eindhoven, NL;

Martin Jules Marie-emile DE Nivelle, Eindhoven, NL;

Jan Stoeten, Eindhoven, NL;

Erwin Antonius Martinus Van Alphen, Eindhoven, NL;

Inventors:

Hielke Schoonewelle, Veldhoven, NL;

Marcus Emile Joannes Boonman, Waarle, NL;

Ralph Brinkhof, Eindhoven, NL;

Martin Jules Marie-Emile De Nivelle, Eindhoven, NL;

Jan Stoeten, Eindhoven, NL;

Erwin Antonius Martinus Van Alphen, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method according to one embodiment of the invention includes determining a map of a second part of a substrate belonging to a group of substrates. The method includes measuring a first part of at least one substrate belonging to the group to create an average profile map or average height map and computing a map of the second part of the substrate belonging to the group, based on the average profile map or the average height map. The computed map is stored for use during a later determination of a height or tilt of a substrate from the group.


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