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For the Inventor, By the Inventor

Eindhoven, Netherlands

Martin Jules Marie-Emile De Nivelle

USPTO Granted Patents = 8

Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Eindhoven, NL (2006 - 2013)
  • Waalre, NL (2021 - 2023)

Company Filing History:

goldMedal8 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2006-2025

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8 patents (USPTO):Explore Patents
1. 12339594 - Substrate level sensing in a lithographic apparatus (2025-06-24),
2. 11662669 - Apparatus and method for measuring substrate height (2023-05-30),
3. 11029614 - Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus (2021-06-08),
4. 8411254 - Device manufacturing method, control system, computer program and computer-readable medium (2013-04-02),
5. 8174678 - Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method (2012-05-08),
6. 7649635 - Method for determining a map, device manufacturing method, and lithographic apparatus (2010-01-19),
7. 7292351 - Method for determining a map, device manufacturing method, and lithographic apparatus (2007-11-06),
8. 7113257 - Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus (2006-09-26),

Title: Innovator Spotlight: Martin Jules Marie-Emile De Nivelle

Introduction:

Martin Jules Marie-Emile De Nivelle, a distinguished inventor based in Eindhoven, NL, is renowned for his innovative contributions in the field of lithography. With an impressive portfolio of 7 patents to his name, De Nivelle continues to make significant advancements in substrate measurement technologies.

Latest Patents:

De Nivelle's latest patents showcase his expertise in developing cutting-edge technologies for measuring substrate height with precision and accuracy. His inventions include an apparatus and method for measuring substrate height, incorporating multiple sensors and advanced processing techniques to enhance measurement reliability.

Career Highlights:

Currently affiliated with ASML Netherlands B.V., De Nivelle plays a pivotal role in driving technological innovation within the company. His expertise in lithography and substrate measurement has been instrumental in the development of state-of-the-art lithographic apparatus.

Collaborations:

De Nivelle collaborates closely with esteemed colleagues such as Ralph Brinkhof and Marcus Emile Joannes Boonman. Together, they form a dynamic team dedicated to pushing the boundaries of technological innovation in the field of lithography.

Conclusion:

In conclusion, Martin Jules Marie-Emile De Nivelle stands out as a visionary inventor known for his groundbreaking work in substrate measurement technologies. His contributions have not only elevated the field of lithography but have also established him as a respected figure in the realm of innovation and invention.

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