This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2023-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023-2026
Title: HieChul Kim: Innovator in Semiconductor Technology
Introduction
HieChul Kim is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in methods for thin film formation. With a total of 3 patents, his work is recognized for its innovative approaches to substrate processing.
Latest Patents
HieChul Kim's latest patents include a "Thin film forming method" and a "Method for filling a gap in a three-dimensional structure on a semiconductor substrate." The thin film forming method involves a substrate processing technique that fills gaps without seams or voids. This method includes providing a substrate with a gap in a reaction chamber, pumping down the chamber to a pressure at or below 5 Torr, and filling the gap with a film by alternately supplying a precursor, a reactant, and radio frequency electromagnetic radiation. The second patent focuses on filling gaps in three-dimensional structures over semiconductor substrates. This method includes depositing a thin film on a three-dimensional structure using reaction gas activated with radio frequency power, followed by etching the deposited film to ensure the trench or hole is filled with a thin film that is free of voids and seams.
Career Highlights
HieChul Kim is currently associated with Asm IP Holding B.V., where he continues to advance his research and development in semiconductor technologies. His innovative methods have the potential to enhance the efficiency and reliability of semiconductor devices.
Collaborations
HieChul Kim has collaborated with notable colleagues, including SungKyu Kang and KiKang Kim. Their combined expertise contributes to the advancement of semiconductor technology and innovation.
Conclusion
HieChul Kim's contributions to semiconductor technology through his patents demonstrate his commitment to innovation in the field. His work not only addresses current challenges but also paves the way for future advancements in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile