Aichi, Japan

Hideyuki Tokushima

This inventor holds 3 USPTO granted patents. Top assignee: Fujimi Incorporated. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideyuki Tokushima. Retrieved from https://idiyas.com/inventor/hideyuki-tokushima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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3 patents (USPTO):Explore Patents

Title: The Innovations of Hideyuki Tokushima

Introduction

Hideyuki Tokushima is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of surface treatment technologies, particularly in the semiconductor industry. His work focuses on improving the efficiency and effectiveness of surface treatment processes.

Latest Patents

Tokushima holds a patent for a surface treatment composition, surface treatment method, and method for producing semiconductor substrates. This invention provides a means capable of sufficiently removing residues remaining on the surface of a polished object. The surface treatment composition contains components (A) to (C) and has a pH of more than 7.0, which enhances its effectiveness in semiconductor applications.

Career Highlights

Tokushima is currently employed at Fujimi Incorporated, a company known for its advanced materials and solutions in the semiconductor industry. His work at Fujimi has allowed him to develop innovative solutions that address critical challenges in surface treatment processes.

Collaborations

One of his notable coworkers is Tsutomu Yoshino, with whom he has likely collaborated on various projects within the company. Their combined expertise contributes to the advancement of technologies in their field.

Conclusion

Hideyuki Tokushima's contributions to surface treatment technologies have made a significant impact on the semiconductor industry. His innovative patent demonstrates his commitment to improving processes and enhancing product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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