The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Sep. 25, 2023
Applicant:
Fujimi Incorporated, Kiyosu, JP;
Inventors:
Hideyuki Tokushima, Kiyosu, JP;
Tsutomu Yoshino, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 7/04 (2006.01); C11D 7/26 (2006.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
C11D 7/3281 (2013.01); C11D 7/04 (2013.01); C11D 7/265 (2013.01); C11D 7/3263 (2013.01); H10P 52/402 (2026.01); C11D 2111/22 (2024.01);
Abstract
Provided is a means for sufficiently removing residues remaining on the surface of a polished object and reducing the surface roughness of the polished object. The present invention relates to a surface treatment composition containing components (A) to (C), and having pH of more than 7.0:
Tokushima, Hideyuki. (2026). Surface treatment composition, surface treatment method, and method for producing semiconductor substrate (U.S. Patent No. 12584083). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12584083
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile