Company Filing History:
Years Active: 1987-2000
Title: Innovations of Hideyuki Shoji
Introduction
Hideyuki Shoji is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of dry etching technology, holding a total of 9 patents. His work has been instrumental in advancing methods used in semiconductor manufacturing.
Latest Patents
One of his latest patents is an apparatus and method for dry etching. This apparatus includes an etching chamber, a pair of electrodes, and a plate with multiple through-holes. The design allows for the generation of plasma in a spatial space defined by enclosures mounted on the electrodes. This innovative approach prevents the exposure of anything other than the object being etched to plasma, thereby minimizing particle generation. Another notable patent is a method for dry-etching a silicon substrate using a selectively formed mask. This method allows for the control of the tapered sectional shape of grooves formed in the silicon substrate, ensuring high reproducibility during the etching process.
Career Highlights
Hideyuki Shoji has worked with notable companies such as NEC Corporation and Casio Computer Co., Ltd. His experience in these organizations has contributed to his expertise in the field of semiconductor technology.
Collaborations
Some of his coworkers include Kazunori Kita and Ken Sasaki. Their collaboration has likely fostered innovation and development in their respective projects.
Conclusion
Hideyuki Shoji's contributions to dry etching technology and his collaborations with esteemed colleagues highlight his importance in the field of semiconductor manufacturing. His innovative patents continue to influence the industry and pave the way for future advancements.