The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2000
Filed:
Sep. 05, 1997
Hideyuki Shoji, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
There is provided an apparatus for carrying out dry etching, including (a) an etching chamber, (b) a pair of electrodes disposed in the etching chamber in facing relation, an object to be etched being placed on one of the electrodes, (c) a plate mounted on the other of the electrodes, the plate being formed with a plurality through-holes, and (d) a pair of enclosures each mounted on each of the electrodes and extending towards the opponent to define a spatial space therebetween in which plasma is generated by introducing a reactive gas thereinto through the through-holes. The enclosures are designed to have a gap therebetween. Both the plate and the enclosures are made of material other than aluminum. The reactive gas is composed only of CF.sub.4. Since nothing other than the object is exposed to plasma, it is possible to prevent generation of particles.