Miyagi, Japan

Hideyuki Osada

USPTO Granted Patents = 4 

Average Co-Inventor Count = 1.7

ph-index = 1

Forward Citations = 540(Granted Patents)


Company Filing History:


Years Active: 2013-2025

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4 patents (USPTO):

Title: Innovations by Hideyuki Osada

Introduction

Hideyuki Osada is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 4 patents to his name, Osada has developed innovative solutions that enhance the efficiency and effectiveness of substrate processing systems.

Latest Patents

Osada's latest patents include a substrate processing apparatus, a purge gas control method, and a vacuum transfer chamber cleaning method. The substrate processing apparatus features a vacuum transfer chamber designed with a transfer robot for substrate handling. It includes a load lock module and a purge gas supply system to maintain optimal processing conditions. Additionally, his substrate processing system incorporates a vacuum transfer module and a substrate cooling stage, which work together to ensure effective particle removal during substrate processing.

Career Highlights

Osada is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on developing advanced technologies that improve substrate processing capabilities. His innovative designs have contributed to the company's reputation for excellence in the field.

Collaborations

Osada has collaborated with esteemed colleagues such as Genichi Nanasaki and Norihiko Amikura. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in substrate processing.

Conclusion

Hideyuki Osada's contributions to substrate processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable asset to the field.

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