This inventor holds 3 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1996-1997.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1996-1997
Title: Hideya Miyazaki: Semiconductor Mask Invention
Introduction
Hideya Miyazaki is an inventor associated with Kawasaki, Japan, and Kabushiki Kaisha Toshiba. His listed patent work includes innovations in reflection phase-shifting masks for pattern formation. Miyazaki is credited with 3 patents.
Latest Patents
Miyazaki’s listed patents include “Phase Shifting Mask and Method of Forming a Pattern Using the Same” and “Reflection Phase Shifting Mask and Method of Forming a Pattern Using the.” Both descriptions concern a reflection phase-shifting mask designed to expose patterns using reflected light with a phase difference.
The described mask includes a substrate that reflects exposure light, a phase-shifting layer formed on part of the substrate, and a light-transmitting medium over the substrate and layer. The layer’s thickness is set so that light reflected from the substrate and light reflected from the phase-shifting layer have a phase difference of 180 degrees.
Career Highlights
Miyazaki’s listed invention addresses a key aspect of pattern formation: controlling reflected light through a phase-shifting layer. His patent record connects this work with Kabushiki Kaisha Toshiba.
Collaborations
Miyazaki’s listed coworkers include Takayuki Iwamatsu and Kenji Kawano.
Conclusion
Hideya Miyazaki’s patent work focuses on reflection phase-shifting masks and their use in forming patterns, highlighting his contribution to semiconductor-related invention.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile