The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 1997
Filed:
Jan. 22, 1996
Takayuki Iwamatsu, Abiko, JP;
Kenji Kawano, Tokyo, JP;
Hideya Miyazaki, Kawasaki, JP;
Shinichi Ito, Yokohama, JP;
Soichi Inoue, Yokohama, JP;
Hiroyuki Sato, Yokohama, JP;
Satoshi Tanaka, Kawasaki, JP;
Koji Hashimoto, Wappingers Falls, NY (US);
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A reflection phase shifting mask used to expose a pattern by forming reflected light having a phase difference upon reflection of light, includes a substrate for reflecting exposure light, a phase shifting layer formed on a portion on the substrate, and a light transmitting medium formed on the substrate and the phase shifting layer, wherein the thickness of the phase shifting layer is set such that the phase difference between light reflected by the substrate and light reflected by the phase shifting layer becomes 180.degree..
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile