Tsukuba, Japan

Hideto Goto


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Tokyo-To, JP (2003)
  • Tsukuba, JP (2005)

Company Filing History:


Years Active: 2003-2005

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Hideto Goto: Pioneer in Semiconductor Technology

Introduction

Hideto Goto is a distinguished inventor based in Tsukuba, Japan, known for his contributions to semiconductor technology. With two patents to his name, Goto has made significant advancements in enhancing manufacturing processes for semiconductor devices.

Latest Patents

Goto's latest patents exemplify his innovative approach. The first patent focuses on a method of manufacturing semiconductor devices. This invention aims to suppress the rise of the dielectric constant of insulating films during the wiring process in semiconductor devices using a damascene method. Specifically, it simplifies the manufacturing process while employing a combined arrangement of a wash unit for particle removal and a processing unit that applies an organic substance to the metal layers, optimizing the formation of protective films.

His second notable patent introduces a method of forming a plated layer to a predetermined thickness. This method enhances the quality of the planarization process compared to conventional techniques. By immersing a processing object and an electrode plate in a solution containing metal ions, a forward current is applied to deposit metal on the object's surface. After excess plating, a backward current is utilized to uniformly remove surplus material, facilitating a refined plating process.

Career Highlights

Hideto Goto is currently associated with Tokyo Electron Limited, a prominent player in the semiconductor manufacturing sector. His expertise and innovative methods have made a considerable impact on the efficiency and quality of semiconductor fabrication.

Collaborations

Throughout his career, Goto has collaborated with notable colleagues such as Takayuki Niuya and Michihiro Ono, contributing to a rich exchange of ideas and advancements in the field of semiconductor technology.

Conclusion

Hideto Goto's work continues to push the boundaries of semiconductor manufacturing processes. With his inventive patents and valuable collaborations, Goto remains a significant figure in advancing technology and engineering within the semiconductor industry. His contributions not only enhance manufacturing efficiency but also set a foundation for future innovations in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…