Koshi, Japan

Hidetaka Shinohara


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Kumamoto, JP (2019 - 2020)
  • Koshi, JP (2021)

Company Filing History:


Years Active: 2019-2021

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3 patents (USPTO):Explore Patents

Title: Innovations by Hidetaka Shinohara

Introduction

Hidetaka Shinohara is an accomplished inventor based in Koshi, Japan. With a strong focus on substrate processing technologies, he holds three patents that reflect his contributions to the field. His work aims to enhance the efficiency and effectiveness of substrate processing, particularly in the semiconductor industry.

Latest Patents

Hidetaka Shinohara's latest patents delve into specific methods and apparatuses for substrate processing. One of his notable inventions is a substrate processing apparatus and method designed to suppress contamination on the bottom surface of a substrate caused by processing liquids. This innovative approach involves parallel processing on both the top and bottom surfaces of a substrate while it is rotated by a holding unit. The control unit effectively manages the supply of processing liquids to minimize contamination.

Another significant patent by Shinohara involves a substrate processing apparatus featuring a dual-nozzle system. The first nozzle ejects droplets of a chemical liquid toward the front surface of the substrate, while the second nozzle applies heated deionized water to the rear surface. This synergistic method of processing is aimed at enhancing the substrate's cleanliness and efficiency during semiconductor manufacturing.

Career Highlights

Hidetaka Shinohara has made substantial contributions through his work at Tokyo Electron Limited, a leading company in the semiconductor equipment sector. His expertise in substrate processing technologies has positioned him as a key figure in advancing methodologies that address common challenges faced in manufacturing.

Collaborations

Throughout his career, Shinohara has collaborated with colleagues such as Shogo Fukui and Seiki Ishida, who share his vision for innovation in semiconductor technology. These collaborations have been instrumental in developing groundbreaking solutions that elevate the industry's standards.

Conclusion

Hidetaka Shinohara's dedication to advancing substrate processing technology is evident through his patented inventions. His work not only contributes to Tokyo Electron Limited but also significantly impacts the broader semiconductor industry. As technology continues to evolve, innovations like those of Shinohara will play a crucial role in shaping future developments.

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