Tokyo Electron Limited

Hidetaka Shinohara

Shogo Fukui

Shuuichi Nishikido

Osamu Miyahara

Seiki Ishida

Noritaka Uchida

Kento Kurusu

Takanori Obaru

Tomohito Ura

Yuya Motoyama

Contamination of a bottom surface of a substrate caused by a processing liquid used for cleaning a top surface of the substrate can be suppressed. After performing a liquid processing on the top surface of the substrate and a liquid processing on the bottom surface of the substrate in parallel while rotating the substrate by a substrate holding/rotating unit, when stopping the liquid processing on the top surface of the substrate and the liquid processing on the bottom surface of the substrate, a control unitstops a supply of the processing liquid onto the top surface of the substrate by a first processing liquid supply device, and then, stops a supply of the processing liquid onto the bottom surface of the substrate by a second processing liquid supply device

Substrate processing apparatus, substrate processing method and recording medium

Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a first nozzle that ejects droplets of a chemical liquid toward a front surface of a substrate, the droplets being formed by mixing a gas supplied by a gas supply mechanism and a heated chemical liquid supplied by a heated chemical liquid supply mechanism with each other, and a second nozzle that ejects the heated deionized water supplied by the heated deionized water supply mechanism toward the rear surface of the substrate. The first nozzle supplies the droplets to the front surface of the substrate heated from the rear surface thereof by the heated deionized water supplied from the second nozzle.

Substrate processing apparatus, substrate processing method and storage medium

Cleaning brush

Growing community of inventors

Koshi, Japan

Hidetaka Shinohara