Kanagawa, Japan

Hidetaka Natsume


Average Co-Inventor Count = 1.5

ph-index = 5

Forward Citations = 96(Granted Patents)


Location History:

  • Tokyo, JP (1997 - 2007)
  • Kanagawa, JP (2007 - 2015)

Company Filing History:


Years Active: 1997-2015

Loading Chart...
20 patents (USPTO):Explore Patents

Title: Innovations of Hidetaka Natsume in Semiconductor Technology

Introduction

Hidetaka Natsume, located in Kanagawa, Japan, is an influential inventor in the field of semiconductor technology. With an impressive portfolio of 20 patents, he has made significant contributions that enhance electronic devices and integrated circuits.

Latest Patents

One of Hidetaka Natsume's latest patents focuses on a semiconductor integrated circuit featuring a thick gate oxide word line driving circuit. This innovation includes multiple driving circuits designed to manage various word lines using either a first or second voltage derived from distinct power supplies, which are controlled by a specific signal. The design also comprises several gate transistors, each connected to respective word lines. Notably, the gate oxide film of these transistors is thinner compared to that of transistors within the driving circuits, optimizing performance and efficiency in semiconductor applications.

Career Highlights

Throughout his career, Hidetaka has made notable advancements while working with prominent companies such as NEC Corporation and Renesas Electronics Corporation. His experience in these esteemed organizations has equipped him with valuable insights and expertise in engineering and innovation.

Collaborations

Hidetaka Natsume has collaborated with esteemed colleagues, including Satoshi Yamamoto and Takami Hiruma. These partnerships have fostered innovative ideas and propelled forward-thinking solutions in semiconductor technology.

Conclusion

Hidetaka Natsume’s contributions to the field of semiconductor technology through his patents and collaborations greatly impact the electronics industry. His inventive spirit and dedication to innovation continue to inspire advancements that shape the future of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…