Hideki Umekawa

Title: Innovations by Hideki Umekawa

Introduction

Hideki Umekawa is a notable inventor based in Tsukuba, Japan. He has made significant contributions to the field of nanoimprint technology, holding a total of 3 patents. His work focuses on developing advanced materials and methods that enhance the efficiency and effectiveness of nanoimprinting processes.

Latest Patents

Umekawa's latest patents include a photo-curable nanoimprint composition, a method for formatting patterns using this composition, and a nanoimprint replica mold comprising the cured product of the composition. The photo-curable nanoimprint composition boasts excellent properties in terms of etching resistance, dispersibility, and productivity. It allows for easy transcription of patterns even when a mold is pressed with relatively low pressure. The composition includes a partial hydrolysate obtained by hydrolyzing a mixture of an organic silicon compound and a silicon compound containing (meth)acrylic groups. Additionally, it contains a polymerizable monomer with (meth)acrylic groups and a photopolymerization initiator. Furthermore, the mixture may include a partial hydrolysate of a fluorinated silicone compound and/or metal oxide.

The method for manufacturing a silicon substrate with a textured structure simplifies the process compared to conventional methods. It involves forming a pattern on the silicon substrate using a resin-comprising composition, irradiating an etching gas to the silicon substrate surface, and processing the substrate with an alkaline etching fluid to create a concave structure under the pattern portion. This innovative approach allows for the easy formation of regular texture structures on the silicon substrate surface.

Career Highlights

Umekawa has worked with prominent companies such as Tokuyama Corporation and Sun-tox Co., Ltd. His experience in these organizations has contributed to his expertise in the field of nanoimprint technology and materials science.

Collaborations

Throughout his career, Umekawa has collaborated with notable individuals, including Yoji Inui and Naoto Mochizuki. These collaborations have further enriched his work and contributed to advancements in his field.

Conclusion

Hideki Umekawa's innovative contributions to nanoimprint technology demonstrate his commitment to advancing materials and methods in this area. His patents reflect a deep understanding of the complexities involved in the field, and his collaborations highlight the importance of teamwork in driving innovation.