The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2007
Filed:
Sep. 13, 2002
Yoji Inui, Hikari, JP;
Naoto Mochizuki, Shunan, JP;
Isao Masada, Shunan, JP;
Ryuji Ishimoto, Shunan, JP;
Hideki Umekawa, Shunan, JP;
Hironori Honda, Shunan, JP;
Yoshihiro Kimura, Kudamatsu, JP;
Yoji Inui, Hikari, JP;
Naoto Mochizuki, Shunan, JP;
Isao Masada, Shunan, JP;
Ryuji Ishimoto, Shunan, JP;
Hideki Umekawa, Shunan, JP;
Hironori Honda, Shunan, JP;
Yoshihiro Kimura, Kudamatsu, JP;
Tokuyama Corporation, Yamaguchi, JP;
Sun-Tox Co., Ltd., Tokyo, JP;
Abstract
Provided are a gas-barrier film which is a laminate comprising a substrate layer comprising a thermoplastic resin film and a gas-barrier layer comprising a hydrolysate of a silicon alkoxide, a stratified silicate and a polyvinyl alcohol base resin, wherein a radius (Rg) of gyration of a scattering matter which is measured by light scattering in the gas-barrier layer described above is 2.4 μm or less, and the silicon alkoxide and/or the hydrolysate thereof are present between the layers of the stratified silicate present in the above gas-barrier layer. The above film shows an excellent gas-barrier property even under such a high humidity as exceeding 90% RH.