The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Oct. 19, 2011
Hideki Umekawa, Tsukuba, JP;
Yuichiro Kawabata, Tsukuba, JP;
Yuko Sasaki, Tsukuba, JP;
TOKUYAMA CORPORATION, Yamaguchi, JP;
Abstract
Provided is a photo-curable nanoimprint composition that has excellent properties in terms of etching resistance, dispersibility, and productivity. In addition, the photo-curable nanoimprint composition enables easy transcription of patterns even when a mold is pressed with a relatively low pressure. The photo-curable nanoimprint composition includes: (A) partial hydrolysate obtained by hydrolyzing a mixture of an organic silicon compound and a silicon compound containing (meth)acrylic groups with water in the molar amount of not less than 0.1 times but less than 1.0 times with respect to the number of moles of all alkoxy groups present in the mixture; (B) polymerizable monomer containing (meth)aclyic groups; and (C) pothopolymerization initiator. In addition, the mixture of partial hydrolysate (A) may include further partial hydrolysate of fluorinated silicone compound and/or metal oxide.