This inventor holds 5 USPTO granted patents. Top assignees: Hitachi, Ltd., Anelva Corporation. Active years: 1983-1989.
Company Filing History:
5 out of 42,719 
1 out of 256 Years Active: 1983-1989
Title: The Innovations of Hideki Tateishi
Introduction
Hideki Tateishi is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 5 patents. His work has advanced the methods used for film deposition, which is crucial in various manufacturing processes.
Latest Patents
Tateishi's latest patents include a sputtering process and an apparatus for carrying out the same. This invention focuses on forming a film of a film-forming material over the surface of a substrate. In this process, a target formed of the film-forming material is held on a sputtering electrode that receives a voltage. The substrate is positioned at a predetermined distance opposite the target. A high-density plasma is generated by creating a cusp field between the target and the substrate. A bias voltage is applied to the substrate's surface, allowing ions from the high-density plasma to impact the substrate. This results in the particles of the film-forming material being sputtered from the target and depositing as a thin film on the substrate's surface. Another significant patent is the continuous sputtering apparatus, which consists of a main vacuum chamber, a loading station, and multiple process stations with individually controlled pressures. This innovative design enhances the efficiency of the sputtering process.
Career Highlights
Throughout his career, Hideki Tateishi has worked with prominent companies such as Hitachi, Ltd. and Anelva Corporation. His experience in these organizations has contributed to his expertise in sputtering technology and film deposition processes.
Collaborations
Tateishi has collaborated with notable colleagues, including Susumu Aiuchi and Tsuneaki Kamei. These partnerships have likely fostered innovation and advancements in their respective fields.
Conclusion
Hideki Tateishi's contributions to sputtering technology and his innovative patents have made a significant impact in the industry. His work continues to influence the development of advanced manufacturing processes.