Tokyo, Japan

Hideki Fukushima



Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Higashichichibu, JP (2010 - 2013)
  • Hitachinaka, JP (2013 - 2015)
  • Tokyo, JP (2016 - 2021)

Company Filing History:


Years Active: 2010-2021

Loading Chart...
Loading Chart...
10 patents (USPTO):

Title: Innovations of Hideki Fukushima

Introduction

Hideki Fukushima is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of defect inspection technology, holding a total of 10 patents. His work focuses on improving processing efficiency in defect inspection systems.

Latest Patents

Fukushima's latest patents include a defect inspection apparatus and a pattern chip. The defect inspection apparatus is designed to enhance processing efficiency by quickly adjusting the position of a detection system. It features a stage that moves with a sample and a pattern substrate, an illumination optical system, and two detection optical systems that process scattered light signals. The control unit of the apparatus implements adjustment processing to optimize the detection of defects. Additionally, his defect inspection device utilizes an illumination light shaped to detect defects on the surface of a sample or pattern chip, ensuring high precision in defect detection.

Career Highlights

Throughout his career, Hideki Fukushima has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies in defect inspection.

Collaborations

Fukushima has collaborated with talented individuals in his field, including Yukihiro Shibata and Yuta Urano. These collaborations have contributed to the advancement of his research and the successful development of his inventions.

Conclusion

Hideki Fukushima's contributions to defect inspection technology demonstrate his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to enhancing efficiency and precision in defect detection systems.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…