This inventor holds 2 USPTO granted patents. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1994-2000.
Location History:
- Itami, JP (1994)
- Hyogo, JP (2000)
Company Filing History:
Years Active: 1994-2000
Title: The Innovations of Hidehiko Kozawa
Introduction
Hidehiko Kozawa is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of technology, particularly in the area of phase shift masks and pattern monitoring methods. With a total of 2 patents to his name, Kozawa's work has had a considerable impact on the industry.
Latest Patents
Kozawa's latest patents include a "Phase shift mask of attenuation type and manufacturing method thereof." This invention involves an auxiliary pattern that controls the amount of exposure light onto a portion of an exposed material. The auxiliary pattern effectively cancels light intensity of a side lobe, preventing the generation of high light intensity regions at the periphery of the light transmitting portion. Another significant patent is the "Method of monitoring accuracy with which patterns are written." This method includes steps for disposing a monitor pattern zone in an exposure zone, partitioning it into overlapping fields, forming checking patterns, and measuring alignment accuracy through electron beam exposure.
Career Highlights
Kozawa is currently employed at Mitsubishi Electric Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of phase shift masks and pattern monitoring techniques.
Collaborations
Some of his notable coworkers include Nobuyuki Yoshioka and Haruhiko Kusonose, who have collaborated with him on various projects.
Conclusion
Hidehiko Kozawa's contributions to technology through his patents and work at Mitsubishi Electric Corporation highlight his role as a significant inventor in the field. His innovative approaches continue to influence advancements in the industry.