The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1994
Filed:
Jan. 21, 1992
Applicant:
Inventors:
Haruhiko Kusonose, Itami, JP;
Hidehiko Kozawa, Itami, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ; 2504922 ;
Abstract
A method of monitoring the accuracy with which patterns are written includes the steps of: disposing in an exposure zone a monitor pattern zone for monitoring accuracy; partitioning the monitor pattern zone into a plurality of fields so that the fields overlap each other; forming checking patterns where the plurality of fields overlap each other; and measuring an alignment accuracy in the checking patterns by exposing the plurality of fields to an electron beam and inspecting the exposed field.
Quick Actions:
Kusonose, Haruhiko. (1994). Method of monitoring accuracy with which patterns are written (U.S. Patent No. 5296917). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5296917
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