Itami, Japan

Haruhiko Kusonose

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruhiko Kusonose. Retrieved from https://idiyas.com/inventor/haruhiko-kusonose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Haruhiko Kusonose: Innovator in Pattern Monitoring Technology

Introduction

Haruhiko Kusonose is a notable inventor based in Itami, Japan. He has made significant contributions to the field of pattern monitoring technology. His innovative approach has led to the development of a unique method that enhances the accuracy of pattern writing.

Latest Patents

Kusonose holds a patent for a method of monitoring the accuracy with which patterns are written. This method includes several steps: disposing a monitor pattern zone in an exposure zone for accuracy monitoring, partitioning the monitor pattern zone into overlapping fields, forming checking patterns at the intersections of these fields, and measuring alignment accuracy by exposing the fields to an electron beam for inspection. This patent showcases his expertise in precision technology and its applications.

Career Highlights

Haruhiko Kusonose is associated with Mitsubishi Electric Corporation, where he has been instrumental in advancing technological innovations. His work has not only contributed to the company's success but has also impacted the broader field of electronics and manufacturing.

Collaborations

Kusonose has collaborated with Hidehiko Kozawa, another professional in the field. Their partnership has likely fostered advancements in their respective areas of expertise.

Conclusion

Haruhiko Kusonose's contributions to pattern monitoring technology exemplify the importance of innovation in enhancing accuracy in manufacturing processes. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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