Kikuchi, Japan

Hidehiko Kamiya

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidehiko Kamiya. Retrieved from https://idiyas.com/inventor/hidehiko-kamiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Contributions of Inventor Hidehiko Kamiya from Kikuchi-gun, Japan

Introduction

Hidehiko Kamiya is a talented inventor based in Kikuchi-gun, Japan. With a focus on advancements in substrate processing technology, Kamiya has developed innovative solutions that enhance the efficiency of wafer processing systems. His dedication to the field of invention is exemplified by his patent, which addresses the complexities associated with substrate processing.

Latest Patents

Kamiya holds a patent for a "Substrate Processing Apparatus and Method." This invention features a cassette station, a processing station that includes a coating unit and a developing unit, and an inspecting station equipped with both a film thickness inspecting apparatus and a defect inspecting apparatus. Notably, the layout of these stations is designed so that the inspecting station is positioned midway between the cassette station and the processing station. This integration allows for automatic transfer of wafers between the stations, simplifying the overall operations from substrate processing to inspection while also reducing the necessary time for these processes.

Career Highlights

Kamiya is currently affiliated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector. His work plays a crucial role in advancing technologies that support various stages of wafer manufacturing, making it increasingly efficient and effective.

Collaborations

Throughout his career, Kamiya has collaborated with notable professionals in the industry, including his coworkers Norikatsu Sato and Kunie Ogata. Together, they contribute to innovative projects that push the boundaries of current technology within the semiconductor field.

Conclusion

Hidehiko Kamiya’s contributions to substrate processing technology demonstrate the impactful role of inventors in the advancement of industrial applications. With his innovative patent and collaborative spirit, he exemplifies the essence of ingenuity and dedication in the world of technology and invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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