This inventor holds 1 USPTO granted patent. Top assignee: A.l.m.t. Corporation. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Innovations by Hidefumi Hayashi
Introduction
Hidefumi Hayashi is a notable inventor based in Sakata, Japan. He has made significant contributions to the field of materials science, particularly in the development of heat dissipation substrates for semiconductors. His innovative approach has led to advancements that enhance the performance and efficiency of electronic devices.
Latest Patents
Hayashi holds a patent for a method of producing a heat dissipation substrate made from molybdenum powder impregnated with copper. This process involves creating a copper-molybdenum rolled composite by impregnating melted copper into the voids of a molybdenum powder compact. The resulting composite is then rolled to achieve the desired properties. The final product exhibits a coefficient of linear expansion of 8.3×10/K at temperatures ranging from 30 to 800°C. This substrate material is superior in thermal conductivity compared to traditional CMC clad materials and is easier to machine using a punch press.
Career Highlights
Hayashi is associated with A.L.M.T. Corporation, where he has been instrumental in advancing the company's research and development efforts. His work focuses on creating materials that improve the thermal management of semiconductor devices, which is crucial for the reliability and performance of modern electronics.
Collaborations
Hayashi has collaborated with notable colleagues, including Mitsuo Osada and Norio Hirayama. Their combined expertise has contributed to the successful development of innovative materials and technologies in the field.
Conclusion
Hidefumi Hayashi's contributions to the field of materials science, particularly in the development of heat dissipation substrates, highlight his role as a key innovator. His patented methods and collaborative efforts continue to influence advancements in semiconductor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
