Koshi, Japan

Hideaki Iwasaka

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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3 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Hideaki Iwasaka

Introduction: Hideaki Iwasaka, an innovative inventor based in Koshi, Japan, has made notable contributions to the field of heating treatment apparatus and methods. With two patents to his name, Iwasaka is recognized for his inventive approaches that enhance manufacturing processes in the semiconductor industry.

Latest Patents: Iwasaka's most recent patents include a heating treatment apparatus and a heating treatment method. These innovations involve a side surface unit of a heat treatment space formed by a shutter member, which includes both an outer and inner shutter. Notably, supply air is introduced as a horizontal laminar flow directed towards a wafer, strategically optimizing air flow with a specific ratio of 4:1 between the flow rates of the supplied air sources.

Career Highlights: Iwasaka is currently affiliated with Tokyo Electron Limited, a leading company in the semiconductor equipment manufacturing sector. His work focuses on improving processes related to semiconductor fabrication, showcasing his dedication to advancing technology within the industry.

Collaborations: Throughout his career, Iwasaka has collaborated with esteemed colleagues Kouichi Mizunaga and Takahiro Hayashida. These collaborations not only reflect his ability to work within a team but also his commitment to fostering innovation through collective expertise.

Conclusion: Hideaki Iwasaka's contributions to the field of heating treatment technology continue to play a significant role in semiconductor manufacturing. With his inventive spirit and collaborative nature, Iwasaka stands as a pivotal figure in driving advancements that benefit the industry as a whole.

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