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For the Inventor, By the Inventor

Seoul, South Korea

Heung-soo Park

USPTO Granted Patents = 10

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 58(Granted Patents)


Company Filing History:

goldMedal10 out of 131,324 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 1997-2006

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10 patents (USPTO):Explore Patents
1. 7052918 - Multi-layer film for thin film structure, capacitor using the same and fabrication method thereof (2006-05-30),
2. 6720275 - Methods of fabricating capacitors including Ta2O5 layers in a chamber including changing a Ta2O5 layer to heater separation or chamber pressure (2004-04-13),
3. 6635582 - Method of manufacturing semiconductor device (2003-10-21),
4. 6570253 - Multi-layer film for a thin film structure and a capacitor using the same (2003-05-27),
5. 6555394 - Methods of fabricating capacitors including Ta2O5 layers in a chamber including changing a Ta2O5 layer to heater separation or chamber pressure (2003-04-29),
6. 6277204 - Methods for cleaning wafers used in integrated circuit devices (2001-08-21),
7. 6092539 - In-situ cleaning apparatuses for wafers used in integrated circuit (2000-07-25),
8. 6043206 - Solutions for cleaning integrated circuit substrates (2000-03-28),
9. 5789360 - Cleaning solution for use on a semiconductor wafer following (1998-08-04),
10. 5672230 - Central management system of wet chemical stations (1997-09-30),

Title: Heung-soo Park: Innovator in Thin Film Technologies

Introduction

Heung-soo Park is a prominent inventor based in Seoul, South Korea, known for his significant contributions to the field of thin film technologies. With an impressive portfolio of 10 patents, Park has made notable advancements in the design and fabrication of multi-layer films and capacitors.

Latest Patents

Among Park's latest innovations is a patent for a multi-layer film specifically designed for thin film structures. This invention details a capacitor utilizing the multi-layer film, along with methods for its fabrication. The multi-layer film comprises a composition transition layer situated between lower and upper material layers, which are made of distinct elements with varying interaction parameters. This innovative design allows the concentration of elements within the transition layer to gradually vary, optimizing the performance of capacitors. Additionally, Park has developed methods for fabricating capacitors that include Ta2O5 layers within a process chamber, focusing on changing the temperature and pressure to enhance crystallization of the Ta O layer.

Career Highlights

Heung-soo Park is currently affiliated with Samsung Electronics Co., Ltd., a leading global technology company. His work has not only advanced Samsung's capabilities in thin film technology but also positioned him as a key player in the ongoing evolution of electronic components.

Collaborations

Throughout his career, Park has worked closely with esteemed colleagues, including Jae-inh Song and Young-bum Koh. Their collaboration has resulted in fruitful research and development, pushing the boundaries of existing technologies in their respective fields.

Conclusion

Heung-soo Park's innovative spirit and dedication to research have led to significant advancements in thin film technologies, particularly in the field of capacitors. His contributions not only reflect his expertise as an inventor but also his commitment to fostering innovation within the electronics industry. As technology continues to evolve, the impact of Park's inventions will undoubtedly play a vital role in shaping the future.

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