The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 1997
Filed:
Sep. 01, 1995
Applicant:
Inventors:
Heung-soo Park, Seoul, KR;
Hee-sun Chae, Suwon, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon, KR;
Primary Examiner:
Int. Cl.
CPC ...
B44C / ;
U.S. Cl.
CPC ...
156345 ; 134113 ;
Abstract
A central management system for wet chemical cleaning stations includes a number of wet chemical cleaning stations each having a liquid bath, filter, pump and multiple sensors for sensing the process variables thereof; and a main computer connected to the wet chemical cleaning stations to display, store and process data sensed by the sensors and totally manage the data, to thereby enable effective central management of the cleaning process via the main computer.
Park, Heung-soo. (1997). Central management system of wet chemical stations (U.S. Patent No. 5672230). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5672230
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile