Seoul, South Korea

Heui Jae Pahk

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 77(Granted Patents)


Location History:

  • Bongchun-dong, Kwanak-ku, Seoul, KR (1999)
  • Seoul, KR (1998 - 2017)

Company Filing History:


Years Active: 1998-2025

Loading Chart...
7 patents (USPTO):Explore Patents

Title: Heui Jae Pahk: Innovator in Measurement Technologies

Introduction

Heui Jae Pahk is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of measurement technologies, holding a total of 7 patents. His innovative work focuses on systems that enhance the accuracy and efficiency of measuring physical properties of materials.

Latest Patents

Among his latest patents is a system for measuring the thickness and physical properties of thin films using a spatial light modulator. This inventive concept includes a spatial light modulator, a first beam splitter, an objective lens, a second beam splitter, a first camera for acquiring surface images, an optical fiber with a light receiving unit, and a spectrometer for measuring light intensity. Another notable patent is a three-dimensional shape measuring device capable of measuring color information. This apparatus utilizes an interferometer to measure the shape of an object while also capturing its color information, featuring a light source, a light divider, a lens unit, a light detector, and a light adjuster to minimize interference.

Career Highlights

Heui Jae Pahk has worked with SNU Precision Co., Ltd., where he has applied his expertise in measurement technologies. His career reflects a commitment to advancing the field through innovative solutions.

Collaborations

He has collaborated with notable colleagues, including Seong Ryong Kim and Suk Won Lee, who have contributed to his projects and research endeavors.

Conclusion

Heui Jae Pahk's contributions to measurement technologies demonstrate his innovative spirit and dedication to enhancing the accuracy of material analysis. His patents reflect a deep understanding of the complexities involved in measurement systems, making him a significant figure in his field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…