Waalre, Netherlands

Herman Harry Borggreve

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Herman Harry Borggreve. Retrieved from https://idiyas.com/inventor/herman-harry-borggreve

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Herman Harry Borggreve

Introduction

Herman Harry Borggreve is a notable inventor based in Waalre, Netherlands. He has made significant contributions to the field of lithographic radiation systems, particularly through his innovative designs in droplet generation technology.

Latest Patents

Borggreve holds a patent for a "Hybrid droplet generator for extreme ultraviolet light sources in lithographic radiation systems." This invention features a droplet generator nozzle that includes a metal body, a metal fitting, and a capillary. The design allows for the ejection of initial droplets of a material, which is crucial for the functioning of advanced lithographic systems. The electromechanical element within the nozzle is configured to apply changes that affect droplet generation, enhancing the efficiency and precision of the process.

Career Highlights

Herman Harry Borggreve is currently employed at ASML Netherlands B.V., a leading company in the development of photolithography equipment used in the semiconductor industry. His work at ASML has positioned him at the forefront of technological advancements in the field.

Collaborations

Borggreve has collaborated with notable colleagues such as Brandon Michael Johnson and Dietmar Uwe Herbert Trees. These collaborations have contributed to the development of innovative solutions in the lithography sector.

Conclusion

Herman Harry Borggreve's contributions to droplet generation technology have made a significant impact on the lithographic radiation systems used in modern semiconductor manufacturing. His innovative spirit and collaborative efforts continue to drive advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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