This inventor holds 3 USPTO granted patents. Top assignees: Censor Patent- Und Versuchs-Anstalt, Other. Active years: 1981-1984.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Eschen, AT (1981 - 1983)
- FL-9492 Eschen, AT (1984)
Company Filing History:
2 out of 15 
1 out of 834,513 Years Active: 1981-1984
Title: Herbert E Mayer: Innovator in Semiconductor Technology
Introduction
Herbert E Mayer is a notable inventor based in Eschen, Austria, recognized for his contributions to semiconductor technology. With a total of three patents to his name, Mayer has made significant advancements in the field of projection copying and mask patterning.
Latest Patents
Mayer's latest patents include an "Apparatus for the projection copying of mask patterns on a workpiece." This innovative apparatus is designed for the projection copying of patterns defined by masks onto a workpiece, such as a semiconductor wafer coated with photoresist during the production of integrated circuit units. The apparatus features a stage with a cross-feed mechanism that allows for precise positioning of a wafer chuck in both the X and Y directions within a horizontal wafer plane, where the projection beam is focused. The design includes a base plate supported by three spaced-apart posts that enable infinitesimal vertical adjustments, ensuring that the axis of tilt is located substantially in the wafer plane.
Another significant patent is the "Method of projecting printing on semiconductor substrate and workpiece." This method involves the projection-copying of a mask onto a workpiece that includes a light-reflecting semiconductor substrate. The alignment of the mask and workpiece is achieved by illuminating marks on the substrate, which appear dark against a brighter surrounding area. To enhance visibility, a partly reflecting surface layer with nonuniform optical thickness is applied over the substrate, limiting interference reflections to isolated regions.
Career Highlights
Throughout his career, Herbert E Mayer has worked with various organizations, including Censor Patent- und Versuchsanstalt. His work has focused on developing technologies that enhance the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Due to space constraints, the details of collaborations will not be included.
Conclusion
Herbert E Mayer's innovative patents and contributions to semiconductor technology highlight his role as a significant inventor in the field. His work continues to influence advancements in integrated circuit production and projection copying methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile