The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 1984
Filed:
Nov. 25, 1981
Herbert E Mayer, FL-9492 Eschen, AT;
Other;
Abstract
An apparatus for the projection copying of patterns defined by masks on a workpiece, e.g. a semiconductor wafer coated with a photoresist in the production of integrated circuit units, comprises a stage with a cross-feed for positioning a wafer chuck in the X and Y direction in a horizontal wafer plane at which the projection beam is focused. According to the invention, the stage is supported on a base plate which, in turn, is mounted on three spaced-apart posts capable of infinitesimal vertical adjustment, guide surfaces or lines between the base plate and the structure on which it is supported having normals some of which intersect substantially in the wafer plane so that the axis of tilt, which can be generated by differentially adjusting the posts, is located substantially in the wafer plane.