The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1981
Filed:
Oct. 10, 1979
Herbert E Mayer, Eschen, AT;
Censor Patent-und Versuchs-Anstalt, Vaduz, LI;
Abstract
A device for the projection printing of the masks of a mask set onto a semiconductor substrate comprising a projection lens for imaging the patterns of said masks on photosensitive layers of said substrate. Alignment patterns are disposed said masks and alignment targets on said substrate. Said alignment patterns of at least one of said masks and said alignment targets of said substrate are positioned in non-conjugated areas in respect of the projection lens, i.e. in areas which cannot be imaged into one another by means of said projection lens. For the alignment process between said mask and said substrate auxiliary optical means are provided, said alignment targets of said substrate and said alignment patterns of said mask being imaged into one another by means of said auxiliary optical means.