Hilvarenbeek, Netherlands

Henricus Petrus Versteijnen

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Henricus Petrus Versteijnen. Retrieved from https://idiyas.com/inventor/henricus-petrus-versteijnen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Henricus Petrus Versteijnen

Introduction:

Henricus Petrus Versteijnen, a talented inventor hailing from Hilvarenbeek, NL, has made significant contributions to the technological landscape with his innovative mind and passion for problem-solving. With a patent to his name and a wealth of knowledge in his field, Versteijnen is a driving force in the world of lithographic apparatus and methods.

Latest Patents:

Versteijnen's groundbreaking patent titled "Lithographic Apparatus and Method" showcases his expertise in developing advanced technologies to enhance substrate table performance. The patent introduces a novel approach of utilizing heaters grouped in segments to improve heat load management on substrates. Furthermore, the incorporation of temperature sensors embedded within the substrate table ensures precise control and efficiency in the lithographic process.

Career Highlights:

Currently affiliated with ASML Netherlands B.V., a renowned company at the forefront of semiconductor technology, Versteijnen continues to push the boundaries of innovation in the industry. His role within the company signifies his dedication to driving technological advancements and pioneering solutions for complex challenges in lithography.

Collaborations:

Versteijnen's innovative spirit is further amplified through collaborations with esteemed colleagues such as Johannes Henricus Wilhelmus Jacobs and Martinus Hendrikus Antonius Leenders. Together, they form a dynamic team that thrives on collective creativity and ingenuity, resulting in groundbreaking advancements within the field of lithography.

Conclusion:

In conclusion, Henricus Petrus Versteijnen stands as a testament to the power of passion and dedication in the realm of technological innovation. His inventive contributions, exemplified by his patent and successful career at ASML Netherlands B.V., underscore his status as a visionary inventor shaping the future of lithographic technologies. Versteijnen's journey serves as an inspiration to aspiring inventors and underscores the importance of continuous innovation in advancing technological frontiers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…