Heng-Seng Huang

Title: The Innovative Contributions of Heng-Seng Huang

Introduction

Heng-Seng Huang is a notable inventor based in Taipei, Taiwan, known for his significant contributions to the field of semiconductor technology. His innovation, encapsulated in a single patent, presents a pivotal advancement in measuring effective gate channel lengths in electronic devices.

Latest Patents

Huang holds a patent titled "Method for measuring effective gate channel length during C-V method." This invention introduces a capacitance-voltage (C-V) technique that allows for the simultaneous measurement of gate-to-drain overlap length and gate etch bias length in a device. The advantage of this method lies in its capability to achieve a measurement deviation of less than 5% compared to actual gate lengths as determined by scanning electron microscopy (SEM). Moreover, the method utilizes straightforward simultaneous equations, which can be employed by individuals or automated systems. As device layouts continue to shrink, the significance of this method in accurately assessing critical parameters becomes increasingly important.

Career Highlights

Heng-Seng Huang is associated with United Microelectronics Corporation (UMC), where he applies his expertise in semiconductor technology. His work at UMC reflects his commitment to advancing the industry through practical and innovative solutions.

Collaborations

Huang collaborates with esteemed colleagues such as Gary Y. Hong and Yue-Shiun Lee. Together, they engage in collaborative efforts to enhance research and development in semiconductor technologies, contributing to the growth and evolution of the industry.

Conclusion

Heng-Seng Huang's inventive spirit and dedication to advancing semiconductor technology have positioned him as a prominent figure in the field. His patent exemplifies the importance of innovation in developing accurate measurement techniques, which are crucial to the performance of modern electronic devices. As the technology continues to evolve, contributions like those of Huang will pave the way for future advancements.