Santa Clara, CA, United States of America

Heng Pan

USPTO Granted Patents = 8 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2015-2021

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8 patents (USPTO):

Title: **Innovative Contributions of Heng Pan in the Field of Dielectric Films and Oxidation Techniques**

Introduction

Heng Pan, a prominent inventor based in Santa Clara, CA, has made significant strides in the realm of materials processing. With a total of eight patents to his name, his inventive contributions focus primarily on methods for treating dielectric films and selective oxidation processes.

Latest Patents

Among his latest patents, Heng Pan has developed groundbreaking methodologies for conformal treatment of dielectric films. One such patent details a method that involves exposing a dielectric layer to active radical species formed in plasma, followed by heating the layer to peak temperatures between 900 and 1200 degrees Celsius, maintaining these temperatures for brief periods between 1 to 20 seconds.

Another notable patent addresses the selective oxidation of silicon at lower temperatures using a remote plasma source. This invention enables the selective oxidation of exposed silicon surfaces through an apparatus that includes a thermal processing chamber and an innovative method that utilizes hydrogen and remote plasma comprising oxygen to activate treatment gases.

Career Highlights

Currently, Heng Pan is affiliated with Applied Materials, Inc., a leader in materials engineering solutions. His role at the company allows him to leverage his expertise to push forward cutting-edge technologies in the semiconductor space. His patent portfolio highlights his deep understanding of advanced processing techniques and their implications in various applications.

Collaborations

Throughout his career, Heng Pan has collaborated with notable colleagues, including Matthew S. Rogers and Christopher Sean Olsen. Their combined efforts in research and development have fostered a productive environment conducive to innovation in the field of materials science.

Conclusion

Heng Pan's contributions to the development of methods for dielectric treatment and selective oxidation illuminate his role as an innovative force in materials engineering. As he continues to advance these technologies at Applied Materials, Inc., his work emphasizes the critical importance of innovation in enhancing manufacturing processes and material quality in the semiconductor industry.

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