The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Apr. 08, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Heng Pan, Santa Clara, CA (US);
Matthew Scott Rogers, Mountain View, CA (US);
Johanes F. Swenberg, Los Gatos, CA (US);
Christopher S. Olsen, Fremont, CA (US);
Wei Liu, San Jose, CA (US);
David Chu, Campbell, CA (US);
Malcom J. Bevan, Santa Clara, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/469 (2006.01); H01L 21/31 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02252 (2013.01); H01L 21/02112 (2013.01);
Abstract
Disclosed are apparatus and methods for processing a substrate. The substrate having a feature with a layer thereon is exposed to an inductively coupled plasma which forms a substantially conformal layer.