The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
Mar. 10, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Heng Pan, Santa Clara, CA (US);
Kevin J. Bautista, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01); C30B 25/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68735 (2013.01); H01L 21/67115 (2013.01); C23C 16/4585 (2013.01); C30B 25/12 (2013.01); H01L 21/67248 (2013.01);
Abstract
Embodiments of the present invention generally relate to a support ring for supporting a substrate during thermal processing in a process chamber. The support ring generally includes a ring body, an outer rib extending from a first surface of the ring body, a midrib extending from the first surface of the ring body, and a substrate support extending from a second surface of the ring body. The support ring reduces thermal coupling between a substrate and the support ring.