Aalen, Germany

Heinz Mann



Average Co-Inventor Count = 8.2

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2006-2008

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Heinz Mann

Introduction

Heinz Mann is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of optics, particularly in the design of facet mirrors. With a total of 2 patents to his name, Mann's work has implications in advanced technologies, especially in microlithography.

Latest Patents

Mann's latest patents include innovative designs for facet mirrors. The first patent describes a facet mirror that features multiple mirror facets, each with a spherical or conical facet body equipped with a reflecting surface. The facet body is mounted in a bearing device, allowing for precise adjustments. The second patent further develops this concept, detailing a facet mirror where the mirror facets are mounted jointly in a basic body via bearing devices. This design ensures that the mirror bodies maintain contact with the bearing devices through surface, line, or point contact. These facet mirrors are primarily intended for use in projection objectives of projection exposure machines in microlithography, which are essential for fabricating semiconductor elements.

Career Highlights

Heinz Mann is associated with Carl Zeiss SMT AG, a company renowned for its advancements in optical systems and technologies. His work at this prestigious organization has allowed him to push the boundaries of optical innovation.

Collaborations

Mann has collaborated with notable colleagues, including Hubert Holderer and Andreas Heisler. Their combined expertise has contributed to the development of cutting-edge optical technologies.

Conclusion

Heinz Mann's contributions to the field of optics, particularly through his innovative facet mirror designs, highlight his role as a significant inventor in the industry. His work continues to influence the advancement of technologies in microlithography and semiconductor fabrication.

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