The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
May. 07, 2004
Hubert Holderer, Oberkochen, DE;
Andreas Heisler, Steinheim, DE;
Wolfgang Singer, Aalen, DE;
Markus Weiss, Aalen, DE;
Andreas Seifert, Aalen, DE;
Frank Melzer, Utzmemmingen, DE;
Heinz Mann, Aalen, DE;
Hubert Holderer, Oberkochen, DE;
Andreas Heisler, Steinheim, DE;
Wolfgang Singer, Aalen, DE;
Markus Weiss, Aalen, DE;
Andreas Seifert, Aalen, DE;
Frank Melzer, Utzmemmingen, DE;
Heinz Mann, Aalen, DE;
Carl Zeiss SMT AG, , DE;
Abstract
In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.