Company Filing History:
Years Active: 2015-2017
Title: Heike Scholz: Innovator in Semiconductor Technology
Introduction
Heike Scholz is a prominent inventor based in Hirschfeld, Germany. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work focuses on improving the efficiency and effectiveness of semiconductor devices.
Latest Patents
Heike's latest patents include innovative methods for forming semiconductor devices. One notable patent is a method of forming a semiconductor device that includes shaping a gate structure to avoid spacer removal after silicide formation, thereby suppressing silicide overhang. This method enhances the reliability and performance of semiconductor devices. Another patent addresses the reduction of the impact of front-end-of-line (FEoL) topography on dual stress liner depositions. This involves forming a first nitride layer between and over pFET and nFET devices, followed by a thinning process and the formation of a second nitride layer.
Career Highlights
Heike Scholz is currently employed at GlobalFoundries Inc., a leading company in semiconductor manufacturing. Her expertise and innovative approaches have positioned her as a key player in the industry.
Collaborations
Throughout her career, Heike has collaborated with notable colleagues, including Kai Frohberg and Peter Moll. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Heike Scholz's contributions to semiconductor technology exemplify her dedication to innovation and excellence. Her patents reflect her commitment to advancing the field and improving device performance.