Company Filing History:
Years Active: 2013-2018
Title: Hee-jeon Yang: Innovator in Semiconductor Technology
Introduction
Hee-jeon Yang is a prominent inventor based in Suwon-si, South Korea. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her innovative work focuses on etching methods using plasma, which are crucial for the fabrication of semiconductor devices.
Latest Patents
Hee-jeon Yang's latest patents include an etching method using plasma and a method of fabricating semiconductor devices that incorporate this etching method. The etching method involves generating plasma by supplying process gases to at least one remote plasma source (RPS) and applying power to the RPS. This process allows for the etching of an object by supplying water (HO) and plasma to a process chamber, showcasing her expertise in advanced semiconductor manufacturing techniques.
Career Highlights
Hee-jeon Yang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. Her work at Samsung has positioned her as a key player in the development of innovative semiconductor solutions.
Collaborations
Hee-jeon has collaborated with notable colleagues, including Vladimir Volynets and Sang-jin An, enhancing her research and development efforts in the semiconductor field.
Conclusion
Hee-jeon Yang's contributions to semiconductor technology through her innovative patents and work at Samsung Electronics Co., Ltd. highlight her as a significant figure in the industry. Her advancements in etching methods using plasma are paving the way for future developments in semiconductor fabrication.