The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2013

Filed:

May. 04, 2006
Applicants:

Sang-jean Jeon, Suwon-si, KR;

Jong-rok Park, Seoul, KR;

Sung-yeup SA, Suwon-si, KR;

Hee-jeon Yang, Suwon-si, KR;

Guen-suk Lee, Suwon-si, KR;

Inventors:

Sang-jean Jeon, Suwon-si, KR;

Jong-rok Park, Seoul, KR;

Sung-yeup Sa, Suwon-si, KR;

Hee-jeon Yang, Suwon-si, KR;

Guen-suk Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus to treat a substrate includes a processing chamber including a reaction space where a substrate to be treated is placed and a plasma is formed, a ferrite core having a plurality of poles disposed outside the reaction space and a connector facing the reaction space across the plurality of poles and connecting the plurality of the poles each other, a coil winding around the plurality of poles, and an electric power unit supplying electric power to the coil.


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