Seoul, South Korea

Jong-rok Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong-rok Park. Retrieved from https://idiyas.com/inventor/jong-rok-park-1ma42pzq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Jong-rok Park

Introduction

Jong-rok Park is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of technology, particularly in the development of apparatuses for substrate treatment. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Jong-rok Park holds a patent for an "Apparatus to treat a substrate." This apparatus includes a processing chamber with a reaction space where a substrate is placed and a plasma is formed. It features a ferrite core with multiple poles located outside the reaction space, a connector that faces the reaction space, and a coil that winds around the poles. An electric power unit supplies power to the coil, enhancing the efficiency of the substrate treatment process. He has 1 patent to his name.

Career Highlights

Jong-rok Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His role at Samsung allows him to work on cutting-edge technologies and contribute to innovative projects that shape the future of electronics.

Collaborations

Some of his coworkers include Sang-jean Jeon and Sung-yeup Sa, who collaborate with him on various projects within the company.

Conclusion

Jong-rok Park's contributions to technology through his patent and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor in the field. His innovative spirit continues to drive advancements in substrate treatment technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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