Hwaseong, South Korea

Hee-Ho Ku

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hee-Ho Ku. Retrieved from https://idiyas.com/inventor/hee-ho-ku

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Hee-Ho Ku: Semiconductor Device Innovation

Introduction

Hee-Ho Ku is an inventor associated with Hwaseong, South Korea, and Samsung Electronics Co., Ltd. The supplied information identifies one patent associated with Ku.

Latest Patents

Ku’s listed patent is “Semiconductor Device Including an Optical Measurement Pattern.” It describes a semiconductor substrate with at least two chip regions separated by a scribe lane. A first optical measurement pattern is placed on the substrate, and a second pattern is positioned above it with spacing between the patterns. An electrically conductive, three-dimensional shielding structure surrounds the first pattern. The design brings together optical measurement features and shielding within a semiconductor device.

Career Highlights

The available information connects Ku’s patent work with Samsung Electronics Co., Ltd. The patent record provided highlights an invention focused on optical measurement patterns and a conductive shielding structure.

Collaborations

Ga-Hyun Yang and Young-sik Park are identified as Ku’s coworkers. The supplied details do not specify their roles in the patent or the nature of their collaboration.

Conclusion

Hee-Ho Ku’s listed patent presents a semiconductor-device design that combines layered optical measurement patterns with three-dimensional conductive shielding.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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