Hawren Fang

Title: Hawren Fang: Innovator in Photolithographic Inspection Technologies

Introduction

Hawren Fang is a prominent inventor based in San Jose, CA, known for his contributions to the field of photolithography and machine learning. With a total of 5 patents to his name, Fang has made significant advancements in the inspection of reticles, which are crucial components in semiconductor manufacturing.

Latest Patents

Fang's latest patents include innovative methods for inspecting photolithographic reticles using machine learning. One notable patent discloses methods and apparatus for inspecting a photolithographic reticle. This involves simulating a plurality of reference far field images by inputting reference near field images into a physics-based model. The near field images are generated by a trained deep learning model from a test portion of the design database used to fabricate a test area of a test reticle. The inspection process includes comparing the simulated reference far field reticle images to test images acquired from the test area of the test reticle.

Another significant patent focuses on a system and method for determining the type and size of defects on blank reticles. This system characterizes a specimen by receiving training images of defects, generating a machine learning classifier, and determining defect classifications. The process includes filtering product images, performing binarization, and estimating defect sizes based on the processed images.

Career Highlights

Fang has worked with notable companies in the semiconductor industry, including KLA-Tencor Corporation and KLA Corporation. His experience in these organizations has allowed him to develop and refine his innovative approaches to photolithographic inspection.

Collaborations

Fang has collaborated with talented individuals in his field, including Abdurrahman Sezginer and Rui-Fang Shi. These collaborations have contributed to the advancement of technologies in photolithography and machine learning.

Conclusion

Hawren Fang's work in the field of photolithography and machine learning has led to significant innovations that enhance the inspection processes of reticles. His contributions are vital to the semiconductor industry, showcasing the importance of innovation in technology.